APCVD of dual layer transparent conductive oxides for photovoltaic applications (2015)
Journal Article
Yates, H., Gaskell, J., Thomson, M., Sheel, D., Delaup, B., & Morales-Masis, M. (2015). APCVD of dual layer transparent conductive oxides for photovoltaic applications. Thin Solid Films, 590, 260-265. https://doi.org/10.1016/j.tsf.2015.08.014

We report the atmospheric pressure chemical vapour deposition (APCVD) of a dual layer transparent conductive oxide (TCO). This combines a fluorine doped tin oxide (FTO) base layer with a fluorine doped zinc oxide (FZO) top layer, where we seek to uti... Read More about APCVD of dual layer transparent conductive oxides for photovoltaic applications.

Enhanced optical performance of APCVD zinc oxide via post growth plasma treatment at atmospheric pressure (2015)
Journal Article
Hodgkinson, J., Yates, H., & Sheel, D. (2015). Enhanced optical performance of APCVD zinc oxide via post growth plasma treatment at atmospheric pressure. physica status solidi (c), 12(7), 1016-1021. https://doi.org/10.1002/pssc.201510011

The use of atmospheric pressure (AP) CVD to produce highly developed Transparent Conducting oxides (TCO) for thin film photovoltaic systems has significant potential to reduce manufacturing costs and increase the product scope via in-line process... Read More about Enhanced optical performance of APCVD zinc oxide via post growth plasma treatment at atmospheric pressure.

Method of coating and etching (2014)
Patent
Sheel, D., & Hodgkinson, J. (2014). Method of coating and etching

A method of chemical vapour deposition of a material on a substrate or etch of material from a substrate comprises using a short pulsed power signal to form a short pulsed plasma for enhancing the deposition or etch. The power signal is preferably a... Read More about Method of coating and etching.

Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology (2013)
Journal Article
Hodgkinson, J., & Sheel, D. (2013). Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology. Surface and Coatings Technology, 230, 73-76. https://doi.org/10.1016/j.surfcoat.2013.06.079

Atmospheric pressure (AP) PECVD systems have attracted considerable interest in recent years due to the significant benefits for large area, low cost substrates and low temperature operation. However to date, the film properties have tended to be c... Read More about Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology.

The influence of F-doping in SnO2 thin films (2013)
Journal Article
Yates, H., Evans, P., & Sheel, D. (2013). The influence of F-doping in SnO2 thin films. Physics Procedia, 46, 159-166. https://doi.org/10.1016/j.phpro.2013.07.062

Transparent conductive oxide (TCO) films are widely used in many consumer products. The properties of the TCO can critically affect the efficiency of the application. With this in mind the surface morphological, optical and electrical properties ha... Read More about The influence of F-doping in SnO2 thin films.

The development of high performance SnO2:F as TCOs for thin film silicon solar cells (2012)
Journal Article
Yates, H., Evans, P., Sheel, D., Nicolay, S., Ding, L., & Ballif, C. (2012). The development of high performance SnO2:F as TCOs for thin film silicon solar cells. https://doi.org/10.1016/j.surfcoat.2012.10.040

High performance transparent conducting oxides (TCOs) have significance for optimising photovoltaic (PV) performance. The efficiency of the resulting solar cells is dependent particularly on achieving high light scattering, low resistivity and low... Read More about The development of high performance SnO2:F as TCOs for thin film silicon solar cells.

Antimicrobial activity against hospital-related pathogens of dual layer CuO/TiO2 coatings prepared by CVD (2012)
Journal Article
dual layer CuO/TiO2 coatings prepared by CVD. Chemical Vapor Deposition, 18(4-6), 140-146. https://doi.org/10.1002/cvde.201106978

Photocatalytically active films of TiO2/CuO grown by atmospheric pressure thermal (APT)CVD are investigated for activity against multiple antibiotic-resistant pathogens namely, Acinetobacter baumannii, Escherichia coli, Klebsiella pneumoniae, vancomy... Read More about Antimicrobial activity against hospital-related pathogens of dual layer CuO/TiO2 coatings prepared by CVD.

Deposition of thin film SnO2:F onto aluminium foil for use in flexible tandem solar cells (2011)
Journal Article
Yates, H., Evans, P., Sheel, D., Hessels, A., Dagkaldiran, U., & Gordijn, A. (2011). Deposition of thin film SnO2:F onto aluminium foil for use in flexible tandem solar cells. Thin Solid Films, 519, 7731-7737. https://doi.org/10.1016/j.tsf.2011.05.069

Atmospheric pressure Chemical Vapour Deposition has been used to deposit polycrystalline thin films of SnO2:F on aluminium foil. This foil is used commercially as a temporary substrate in the production of flexible solar cells. The resulting thin... Read More about Deposition of thin film SnO2:F onto aluminium foil for use in flexible tandem solar cells.

Control of tin oxide film morphology by addition of hydrocarbons to the chemical vapour deposition process (2010)
Journal Article
Yates, H., Evans, P., Sheel, D., Remes, Z., & Vanecek, M. (2010). Control of tin oxide film morphology by addition of hydrocarbons to the chemical vapour deposition process. Thin Solid Films, 519, 1334-1340. https://doi.org/10.1016/j.tsf.2010.09.037

In this paper we have shown that it is possible to modify and control the surface morphology of doped SnO2 transparent conducting oxide thin films deposited by atmospheric pressure Chemical Vapour Deposition by use of additives during the deposition... Read More about Control of tin oxide film morphology by addition of hydrocarbons to the chemical vapour deposition process.

Optical absorption losses in electrical contacts used in thin film solar cells (2010)
Journal Article
Holovsky, J., Purkrt, A., Izak, T., Poruba, A., Vanecek, M., Dagkaldiran, U., …Sheel, D. (2010). Optical absorption losses in electrical contacts used in thin film solar cells. Physica status solidi. A, Applied research, 207(9), 2170-2173. https://doi.org/10.1002/pssa.200925432

The standardized techniques to characterize the optical properties of thin films are of high importance for development, optimiza-tion and reliable production of thin film solar cells. We apply op-tical transmittance & reflectance spectroscopy, photo... Read More about Optical absorption losses in electrical contacts used in thin film solar cells.

Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD (2009)
Journal Article
Dagkaldiran, U., Gordijn, A., Finger, G., Yates, H., Evans, P., Sheel, D., …Vanecek, M. (2009). Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD. Materials Science and Engineering: B, 159, 6-9. https://doi.org/10.1016/j.mseb.2008.10.037

In this paper we report the results of a study assessing a newly developed deposition process for Fdoped SnO2 films by CVD operating at atmospheric pressure (APCVD). The technology is designed to be compatible with industrial requirements such as h... Read More about Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD.

Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs (2009)
Journal Article
Yates, H., Evans, P., Sheel, D., Dagkaldiran, U., Gordijn, A., Finger, F., …Vanecek, M. (2009). Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs. International Journal of Nanotechnology, 6(9), 816-827. https://doi.org/10.1504/IJNT.2009.026742

High performance transparent conducting oxides (TCOs), have significance for optimising PV performance. We have developed an advanced atmospheric pressure chemical vapour deposition process, by applying fast experimentation and using a combinatorial... Read More about Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs.

Low temperature growth of photoactive titania by atmospheric pressure plasma (2009)
Journal Article
Hodgkinson, J., Yates, H., & Sheel, D. (2009). Low temperature growth of photoactive titania by atmospheric pressure plasma. Plasma Processes and Polymers, 6(9), 575-582. https://doi.org/10.1002/ppap.200900028

Atmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 8C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing... Read More about Low temperature growth of photoactive titania by atmospheric pressure plasma.

Optical properties of SnO2:F films deposited by atmospheric pressure CVD (2009)
Journal Article
Remes, Z., Vanecek, M., Yates, H., Evans, P., & Sheel, D. (2009). Optical properties of SnO2:F films deposited by atmospheric pressure CVD. Thin Solid Films, 517(23), 6287-6289. https://doi.org/10.1016/j.tsf.2009.02.109

SnO2 thin films, is compatible with industrial requirements such as high process speed, scaling to wide substrate widths and low costs. Precise method for measuring the optical absorptance in the spectral range 300–1700 nm combines transmittance, r... Read More about Optical properties of SnO2:F films deposited by atmospheric pressure CVD.

Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells (2009)
Journal Article
Sheel, D., Yates, H., Evans, P., Dagkaldiran, U., Gordijn, A., Finger, F., …Vanecek, M. (2009). Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells. Thin Solid Films, 517(10), 3061-3065. https://doi.org/10.1016/j.tsf.2008.11.121

The potential of thin film photovoltaic technologies in supporting sustainable energy policies has led to increasing interest in high performance transparent conducting oxides (TCOs), and in particular doped SnO2, as electrical contacts for solar c... Read More about Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells.

The growth of copper oxides on glass by flame assisted chemical vapour deposition (2008)
Journal Article
Yates, H., Brook, L., Sheel, D., Ditta, I., Steele, A., & Foster, H. (2008). The growth of copper oxides on glass by flame assisted chemical vapour deposition. Thin Solid Films, 517(2), 517-521. https://doi.org/10.1016/j.tsf.2008.06.071

Flame assisted chemical vapour deposition is a low cost, relatively simple atmospheric pressure chemical vapour deposition (CVD) technique that is compatible with both small volume, batch, and high volume continuous coating processes. Use of this m... Read More about The growth of copper oxides on glass by flame assisted chemical vapour deposition.

Photoactive thin silver films by atmospheric pressure CVD (2008)
Journal Article
Yates, H., Brook, L., & Sheel, D. (2008). Photoactive thin silver films by atmospheric pressure CVD. International Journal of Photoenergy, 2008(870392), https://doi.org/10.1155/2008/870392

We report the visible and UV activity of thin silver films. The films are grown using a CVD process employing aqueous-based silver precursors, flame-assisted chemical vapour deposition. This approach overcomes many of the previously encountered limit... Read More about Photoactive thin silver films by atmospheric pressure CVD.

Biocidal silver and silver/titania composite films grown by chemical vapour deposition (2008)
Journal Article
chemical vapour deposition. International Journal of Photoenergy, 2008(168185), https://doi.org/10.1155/2008/168185

This paper describes the growth and testing of highly active biocidal films based on photocatalytically active films of TiO2, grownby thermal CVD, functionally and structurallymodified by deposition of nanostructured silver via a novel flame assiste... Read More about Biocidal silver and silver/titania composite films grown by chemical vapour deposition.

Controlled nanostructured silver coated surfaces by atmospheric pressure chemical vapour deposition (2008)
Journal Article
by atmospheric pressure chemical vapour deposition. Chemical Vapor Deposition, 14(1-2), 14-24. https://doi.org/10.1002/cvde.200706654

Thin film silver has been widely reported for its interesting properties. In this paper we describe a route to produce controlled nanostructured silver layers. A combination of Flame Assisted Chemical Vapour Deposition at atmospheric pressure, with... Read More about Controlled nanostructured silver coated surfaces by atmospheric pressure chemical vapour deposition.

Photocatalytic antimicrobial activity of thin surface films of TiO2, CuO and TiO2 /CuO dual layers on Escherichia coli and bacteriophage T4 (2008)
Journal Article
Ditta, I., Steele, A., Liptrott, C., Tobin, J., Tyler, H., Yates, H., …Foster, H. (2008). Photocatalytic antimicrobial activity of thin surface films of TiO2, CuO and TiO2 /CuO dual layers on Escherichia coli and bacteriophage T4. Applied Microbiology and Biotechnology, 79(1), 127-133. https://doi.org/10.1007/s00253-008-1411-8

TiO2 coated surfaces are increasingly studied for their ability to inactivate microorganisms. The activity of glass coated with thin films of TiO2, CuO and hybrid CuO/TiO2 prepared by atmospheric Chemical Vapour Deposition (Ap-CVD) and TiO2 prepared... Read More about Photocatalytic antimicrobial activity of thin surface films of TiO2, CuO and TiO2 /CuO dual layers on Escherichia coli and bacteriophage T4.