Method of coating and etching (2014)
Patent
Sheel, D., & Hodgkinson, J. (2014). Method of coating and etching

A method of chemical vapour deposition of a material on a substrate or etch of material from a substrate comprises using a short pulsed power signal to form a short pulsed plasma for enhancing the deposition or etch. The power signal is preferably a... Read More about Method of coating and etching.

An air spring (2012)
Patent
Coakley, J., & Elliott, A. (2012). An air spring

There is provided an air spring (1) for supporting a load, the air spring (1) comprises a chamber (50) for holding a pressurised gas in use, a load-bearing surface (10) arranged to transmit a force from a load in use to the pressurised gas held in th... Read More about An air spring.

High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films
Patent
Odedra, R., Boag, N., Anthis, J., & Kanjolia, R. (in press). High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films

A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R.sup.1 and R.sup.2 are independently C.sub.2-C.sub.8-a... Read More about High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films.

Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films
Patent
Odedra, R., Boag, N., Anthis, J., Kanjolia, R., & Saly, M. (in press). Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films

Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted .eta..sup.3-allyl)(carbonyl)metal complexes.

Methods of forming thin metal-containing films by chemical phase deposition
Patent
Kanjolia, R., Odedra, R., Boag, N., & Weyburne, D. (in press). Methods of forming thin metal-containing films by chemical phase deposition

Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic layer deposition (ALD) and chemical vapor deposition (CVD), are provided. The methods comprise delivering at least one organometallic precursor to a subs... Read More about Methods of forming thin metal-containing films by chemical phase deposition.

Organometallic precursors for use in chemical phase deposition processes
Patent
Kanjolia, R., Odedra, R., & Boag, N. (in press). Organometallic precursors for use in chemical phase deposition processes

An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R).sub.nM(CO).sub.2(X) (Formula I) wherein: M is Ru, Fe or Os; R is C.sub.1-C.sub.10-alkyl; X is C.sub.1-C.sub.10-alkyl; and n is 1, 2, 3, 4 or 5. The pr... Read More about Organometallic precursors for use in chemical phase deposition processes.