Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology

Hodgkinson, JL; Sheel, DW

Abstract

Atmospheric pressure (AP) PECVD systems have attracted considerable interest in recent years due to the
significant benefits for large area, low cost substrates and low temperature operation. However to date, the
film properties have tended to be compromised compared to those offered by more established technologies.
In particular whilst growth may be possible at significantly reduced substrate temperatures, the films are typically
amorphous due to reduced surface mobility. Additionally, film density can be reduced compared to
competitive vacuum based approaches due to a lack of ion bombardment. Recent advances in AP plasma
technology have shown considerable potential, with increased stability and with some reports proposing
the possibility of ion based interactions at atmospheric pressure. In this work we apply this new approach
to an APCVD process, enabling control of film growth and crystal structure, indicating significant potential
for application.

Citation

Hodgkinson, J., & Sheel, D. (2013). Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology. Surface and Coatings Technology, 230, 73-76. https://doi.org/10.1016/j.surfcoat.2013.06.079

• Journal Article Type: Article
• Publication Date: Sep 1, 2013
• Deposit Date: Jul 1, 2015
• Journal: Surface & Coatings Technology
• Print ISSN: 0257-8972
• Publisher: Elsevier
• Peer Reviewed: Peer Reviewed
• Volume: 230
• Pages: 73-76
• DOI: https://doi.org/10.1016/j.surfcoat.2013.06.079
• Publisher URL: http://dx.doi.org/10.1016/j.surfcoat.2013.06.079
• Related Public URLs: http://www.journals.elsevier.com/surface-and-coatings-technology
• Additional Information: Funders : Engineering and Physical Sciences Research Council (EPSRC);EU 7th Framework Programme for Research and Technological Development; Projects : Flexible Production Technologies and Equipment Based on Atmospheric Pressure Plasma Processing for 3D Nano Structured Surfaces.; Grant Number: FP7-NMP-N2P CP-IP 214134-2