R Odedra
Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films
Odedra, R; Boag, NM; Anthis, J; Kanjolia, R; Saly, M
Authors
NM Boag
J Anthis
R Kanjolia
M Saly
Abstract
Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted .eta..sup.3-allyl)(carbonyl)metal complexes.
| Acceptance Date | Feb 14, 2014 |
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| Deposit Date | Jun 17, 2015 |
| Additional Information | Corporate Creators : Sigma-Aldrich Co. LLC (St. Louis, MO) Patent Applicant : Odedra, R, Boag, N, Anthis, J, Kanjolia, R, Saly, M Funders : Sigma Aldrich HiTech |