Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films

Odedra, R; Boag, NM; Anthis, J; Kanjolia, R; Saly, M

Abstract

Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted .eta..sup.3-allyl)(carbonyl)metal complexes.

Citation

Odedra, R., Boag, N., Anthis, J., Kanjolia, R., & Saly, M. (in press). Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films

• Acceptance Date: Feb 14, 2014
• Deposit Date: Jun 17, 2015
• Additional Information: Corporate Creators : Sigma-Aldrich Co. LLC (St. Louis, MO); Patent Applicant : Odedra, R, Boag, N, Anthis, J, Kanjolia, R, Saly, M; Funders : Sigma Aldrich HiTech