Selecting critical patterns based on local geometrical and statistical information

Li, Y; Maguire, LP

Abstract

Pattern selection methods have been traditionally developed with a dependency on a specific classifier. In contrast this paper presents a method that selects critical patterns deemed to carry essential information applicable to train those types of classifiers which require spatial information of the training dataset. Critical patterns include those edge patterns that define the boundary and those border patterns that separate classes. The proposed method selects patterns from a new perspective, primarily based on their location in input space. It determines class edge patterns with the assistance of approximated tangent hyperplane of a class surface. It also identifies border patterns between classes using local probability. The proposed method is evaluated on benchmark problems using popular classifiers including multilayer perceptrons, radial basis functions, support vector machines and nearest neighbors. The proposed approach is also compared with four state-of-the-art approaches and it is shown to provide similar but more consistent accuracy from a reduced data set. Experimental results demonstrate that it selects patterns sufficient to represent class boundary and to preserve the decision surface.

Citation

Li, Y., & Maguire, L. (2011). Selecting critical patterns based on local geometrical and statistical information. IEEE transactions on pattern analysis and machine intelligence, 33(6), 1189-1201. https://doi.org/10.1109/TPAMI.2010.188

• Journal Article Type: Article
• Publication Date: Jun 1, 2011
• Deposit Date: Feb 20, 2015
• Journal: IEEE Transactions on Pattern Analysis and Machine Intelligence
• Print ISSN: 0162-8828
• Publisher: Institute of Electrical and Electronics Engineers
• Peer Reviewed: Peer Reviewed
• Volume: 33
• Issue: 6
• Pages: 1189-1201
• DOI: https://doi.org/10.1109/TPAMI.2010.188
• Publisher URL: http://dx.doi.org/10.1109/TPAMI.2010.188
• Related Public URLs: http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=34