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Combustion CVD : exploration of potential for optical thin film synthesis

Gutierrez, GB

Authors

GB Gutierrez



Contributors

DW Sheel D.W.Sheel@salford.ac.uk
Supervisor

ME Pemble
Supervisor

Abstract

The aim of this PhD was to undertake a study of combustion chemical
vapour deposition (combustion CVD or CCVD) for the optical thin film
materials synthesis. The most common variables for thin film formation were
investigated, e.g. precursor volatility/availability and the result was the
development of an innovative process using low-impact velocity aerosol
generation in combination with a premixed propane flame.
To perform coating studies, new equipment was developed that was, in
concept, compatible with the flat glass coating manufacturing process giving the
process industrial compatibility. Deposition of silicon oxide; d and p-block metal
oxides and noble metals were achieved during this work opening opportunities
for new routes to thin film optical materials.
Precursor delivery/availability was significantly extended, demonstrating
the possibility of using cheap, commercially available inorganic salts dissolved
in water (ammonium salts, nitrate salts,...). The mechanisms involved in the
transport/decomposition/thin film formation are discussed in detail providing
alternative explanations to the traditional CVD mechanism reported in the
literature.
The materials deposited were characterised using XPS, XRD, SEM and
AFM and their properties highlighted the flexibility and the novelty of the new
system.

Citation

Gutierrez, G. Combustion CVD : exploration of potential for optical thin film synthesis. (Thesis). Salford : University of Salford

Thesis Type Thesis
Deposit Date Oct 3, 2012
Award Date Jan 1, 2006

This file is under embargo due to copyright reasons.

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