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Deposition of thin film SnO2:F onto aluminium foil for use in flexible tandem solar cells

Yates, HM; Evans, P; Sheel, DW; Hessels, A; Dagkaldiran, U; Gordijn, A

Authors

P Evans

DW Sheel

A Hessels

U Dagkaldiran

A Gordijn



Abstract

Atmospheric pressure Chemical Vapour Deposition has been used to deposit polycrystalline thin films of SnO2:F on aluminium foil. This foil is used commercially as a temporary substrate in the production of flexible solar cells. The resulting thin films were characterised and fabricated into a-Si:H/mc-Si:H tandem solar cells. These devices gave promising initial energy conversion efficiencies up to 7.5% and high current densities. Spectral response measurements showed good blue response indicating sufficient transparent conducting oxide/p-interface and excellent current values for the bottom cell as a result of the high quality of the SnO2:F.

Citation

Yates, H., Evans, P., Sheel, D., Hessels, A., Dagkaldiran, U., & Gordijn, A. (2011). Deposition of thin film SnO2:F onto aluminium foil for use in flexible tandem solar cells. Thin Solid Films, 519, 7731-7737. https://doi.org/10.1016/j.tsf.2011.05.069

Journal Article Type Article
Publication Date Jan 1, 2011
Deposit Date Oct 20, 2011
Journal Thin Solid Films
Print ISSN 0040-6090
Publisher Elsevier
Peer Reviewed Peer Reviewed
Volume 519
Pages 7731-7737
DOI https://doi.org/10.1016/j.tsf.2011.05.069
Publisher URL http://dx.doi.org/10.1016/j.tsf.2011.05.069