CO2 laser micromachining of nanocrystalline diamond films grown on doped silicon substrates

Richter, J.; Abdou, A.; Williams, O.A.; Witzens, J.; Nezhad, M.P.

Abstract

We demonstrate that nanocrystalline diamond films grown on highly doped silicon substrates can be patterned using a CO2 laser operating at a wavelength of 10.6 μm, where both low doped silicon and diamond exhibit negligible optical absorption. The patterning is initiated by free carrier absorption in the silicon substrate and further enhanced by the thermal runaway effect, which results in surface heating in the silicon substrate and subsequent thermal ablation of the diamond film in an oxygen rich atmosphere. Using this approach, micron-scale grating and dot patterns are patterned in thin film diamond. The localized heating is simulated and analyzed using concurrent optical and thermal finite element modelling. The laser patterning method described here offers a cost effective and rapid solution for micro-structuring diamond films.

Citation

Richter, J., Abdou, A., Williams, O., Witzens, J., & Nezhad, M. (2016). CO2 laser micromachining of nanocrystalline diamond films grown on doped silicon substrates. Optical Materials Express, 6, 3916-3926. https://doi.org/10.1364/OME.6.003916

• Journal Article Type: Article
• Publication Date: Nov 23, 2016
• Deposit Date: Aug 12, 2023
• Publicly Available Date: Aug 15, 2023
• Journal: Optical Materials Express
• Publisher: Optical Society of America
• Peer Reviewed: Peer Reviewed
• Volume: 6
• Pages: 3916-3926
• DOI: https://doi.org/10.1364/OME.6.003916