One step process for chemical vapour deposition of titanium dioxide thin films incorporating controlled structure nanoparticles
(2006)
Journal Article
Nolan, M., Pemble, M., Sheel, D., & Yates, H. (2006). One step process for chemical vapour deposition of titanium dioxide thin films incorporating controlled structure nanoparticles. Thin Solid Films, 515(4), 1956-1962. https://doi.org/10.1016/j.tsf.2006.07.182
In this work we describe a two stage chemical-vapour-deposition based route to growing nanoparticle containing thin films. As a model we describe titanium dioxide film formation on glass substrates. The process involves using a gas-to-particle conver... Read More about One step process for chemical vapour deposition of titanium dioxide thin films incorporating controlled structure nanoparticles.