Characterization of chemically assisted ion beam etching and Form birefringence structure fabrication in GaAs using SU-8
(2005)
Presentation / Conference Contribution
We describe an approach to use the thin layer of SU-8 submicron pattern produced by holographic lithography as dry etching mask in chemically assisted ion beam etching (CAIBE) system. The effect of chlorine gas flow on etched sidewall was investigate... Read More about Characterization of chemically assisted ion beam etching and Form birefringence structure fabrication in GaAs using SU-8.