T Peach
The effect of lattice damage and annealing conditions on the hyperfine structure of ion implanted bismuth donors in silicon
Peach, T; Homewood, K; Lourenco, M; Hughes, MA; Saeedi, K; Stavrias, N; Li, J; Chick, S; Murdin, B; Clowes, S
Authors
K Homewood
M Lourenco
Dr Mark Hughes M.A.Hughes@salford.ac.uk
Associate Professor/Reader
K Saeedi
N Stavrias
J Li
S Chick
B Murdin
S Clowes
Abstract
This study reports on high energy bismuth ion implantation into silicon with a particular emphasis on the effect that annealing conditions have on the observed hyperfine structure of the Si:Bi donor state. A suppression of donor bound exciton, D0X, photoluminescence is observed in implanted samples which have been annealed at 700°C relating to the presence of a dense layer of lattice defects that is formed during the implantation process. Hall measurments at 10K show that this implant damage manifests itself at low temperatures as an abundance of p‐type charge carriers, the density of which is observed to have a strong dependence on annealing temperature. Using resonant D0X photoconductivity, we are able to identify the presence of a hyperfine structure in samples annealed at a minimum temperature of 800°C; however, higher temperatures are required to eliminate effects of implantation strain.
Citation
Peach, T., Homewood, K., Lourenco, M., Hughes, M., Saeedi, K., Stavrias, N., …Clowes, S. (2018). The effect of lattice damage and annealing conditions on the hyperfine structure of ion implanted bismuth donors in silicon. Advanced Quantum Technologies, 1(2), 1800038. https://doi.org/10.1002/qute.201800038
Journal Article Type | Article |
---|---|
Acceptance Date | Jun 28, 2018 |
Online Publication Date | Jun 28, 2018 |
Publication Date | Oct 23, 2018 |
Deposit Date | Sep 11, 2018 |
Journal | Advanced Quantum Technologies |
Publisher | Wiley |
Volume | 1 |
Issue | 2 |
Pages | 1800038 |
DOI | https://doi.org/10.1002/qute.201800038 |
Publisher URL | https://doi.org/10.1002/qute.201800038 |
Related Public URLs | https://onlinelibrary.wiley.com/journal/25119044 |
Additional Information | Access Information : This output is also available at: https://epubs.surrey.ac.uk/849366/ Projects : EP/M009564/1 |
You might also like
Coupling of erbium-implanted silicon to a superconducting resonator
(2021)
Journal Article
Spin echo from erbium implanted silicon
(2021)
Journal Article
High speed chalcogenide glass electrochemical metallization cells with various active metals
(2018)
Journal Article
Downloadable Citations
About USIR
Administrator e-mail: library-research@salford.ac.uk
This application uses the following open-source libraries:
SheetJS Community Edition
Apache License Version 2.0 (http://www.apache.org/licenses/)
PDF.js
Apache License Version 2.0 (http://www.apache.org/licenses/)
Font Awesome
SIL OFL 1.1 (http://scripts.sil.org/OFL)
MIT License (http://opensource.org/licenses/mit-license.html)
CC BY 3.0 ( http://creativecommons.org/licenses/by/3.0/)
Powered by Worktribe © 2024
Advanced Search