The growth of copper oxides on glass by flame assisted chemical vapour deposition

Yates, HM; Brook, LA; Sheel, DW; Ditta, IB; Steele, A; Foster, HA

Abstract

Flame assisted chemical vapour deposition is a low cost, relatively simple atmospheric pressure chemical
vapour deposition (CVD) technique that is compatible with both small volume, batch, and high volume
continuous coating processes. Use of this method with low hazard aqueous solutions of simple metal salts
can yield metal oxide thin films, which represents a major advantage in terms of precursor cost and
environmental impact compared to alternative CVD methods. In this paper we report the extension of this
technique to the growth of copper oxides from aqueous solutions of cupric nitrate (Cu(NO3)2) and discuss the
effects on the films of the various growth conditions. It is shown that copper oxide films are produced with
nanostructure controlled properties. Furthermore, we report that these films have strong antibacterial
activity.

Citation

Yates, H., Brook, L., Sheel, D., Ditta, I., Steele, A., & Foster, H. (2008). The growth of copper oxides on glass by flame assisted chemical vapour deposition. Thin Solid Films, 517(2), 517-521. https://doi.org/10.1016/j.tsf.2008.06.071

• Journal Article Type: Article
• Publication Date: Jan 1, 2008
• Deposit Date: Oct 21, 2011
• Journal: Thin Solid Films
• Print ISSN: 0040-6090
• Publisher: Elsevier
• Peer Reviewed: Peer Reviewed
• Volume: 517
• Issue: 2
• Pages: 517-521
• DOI: https://doi.org/10.1016/j.tsf.2008.06.071
• Publisher URL: http://dx.doi.org/10.1016/j.tsf.2008.06.071