Etch-free low loss silicon waveguides using hydrogen silsesquioxane oxidation masks

Nezhad, M.P.; Bondarenko, O.; Khajavikhan, M.; Simic, A.; Fainman, Y.

Abstract

An etch-free fabrication technique for creating low loss silicon waveguides in the silicon-on-insulator material system is proposed and demonstrated. The approach consists of local oxidation of a silicon-on-insulator chip covered with a e-beam patterned hydrogen silsesquioxane mask. A single oxidation step converts hydrogen silsesquioxane to a glass-like compound and simultaneously defines the waveguides, bypassing the need for any wet or dry etching steps. The spectral response of ring resonators fabricated using this technique was used to characterize the waveguide losses. Intrinsic Q-factors as high as 1.57 × 106, corresponding to a waveguide loss of 0.35dB/cm, were measured.

Citation

Nezhad, M., Bondarenko, O., Khajavikhan, M., Simic, A., & Fainman, Y. (2011). Etch-free low loss silicon waveguides using hydrogen silsesquioxane oxidation masks. Optics Express, 19(20), 18827-18832. https://doi.org/10.1364/OE.19.018827

• Journal Article Type: Article
• Acceptance Date: Aug 26, 2011
• Online Publication Date: Sep 13, 2011
• Publication Date: Sep 26, 2011
• Deposit Date: Aug 21, 2024
• Publicly Available Date: Sep 2, 2024
• Journal: Optics Express
• Publisher: Optical Society of America
• Peer Reviewed: Peer Reviewed
• Volume: 19
• Issue: 20
• Pages: 18827-18832
• DOI: https://doi.org/10.1364/OE.19.018827