F. Gholami
Third-order nonlinearity in silicon beyond 2350 nm
Gholami, F.; Zlatanovic, S.; Simic, A.; Liu, L.; Borlaug, D.; Alic, N.; Nezhad, M.P.; Fainman, Y.; Radic, S.
Authors
S. Zlatanovic
A. Simic
L. Liu
D. Borlaug
N. Alic
Dr Maziar Nezhad M.P.Nezhad@salford.ac.uk
Professor Nanophotonics Microsystems Eng
Y. Fainman
S. Radic
Abstract
Measurement of the Kerr nonlinearity in silicon is reported in the 2350 nm to 2750 nm wavelength range, where three-photon absorption effect is present. The measurements confirm that the Kerr interaction strength is comparable to that in the near-infrared. The measured dispersion trend for the Kerr coefficient is consistent with that obtained using Kramers-Krönig relations. Three-photon absorption was measured, and its effect on the nonlinear figure of merit in silicon appears not to be as restrictive as that of two-photon absorption. The results identify silicon as a promising platform for parametric processes in mid-infrared spectral region.
Journal Article Type | Article |
---|---|
Acceptance Date | Aug 8, 2011 |
Online Publication Date | Aug 22, 2011 |
Publication Date | Aug 22, 2011 |
Deposit Date | Aug 21, 2024 |
Journal | Applied Physics Letters |
Print ISSN | 0003-6951 |
Electronic ISSN | 1077-3118 |
Publisher | AIP Publishing |
Peer Reviewed | Peer Reviewed |
Volume | 99 |
Issue | 8 |
DOI | https://doi.org/10.1063/1.3630130 |
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