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Third-order nonlinearity in silicon beyond 2350 nm

Gholami, F.; Zlatanovic, S.; Simic, A.; Liu, L.; Borlaug, D.; Alic, N.; Nezhad, M.P.; Fainman, Y.; Radic, S.

Authors

F. Gholami

S. Zlatanovic

A. Simic

L. Liu

D. Borlaug

N. Alic

Y. Fainman

S. Radic



Abstract



Measurement of the Kerr nonlinearity in silicon is reported in the 2350 nm to 2750 nm wavelength range, where three-photon absorption effect is present. The measurements confirm that the Kerr interaction strength is comparable to that in the near-infrared. The measured dispersion trend for the Kerr coefficient is consistent with that obtained using Kramers-Krönig relations. Three-photon absorption was measured, and its effect on the nonlinear figure of merit in silicon appears not to be as restrictive as that of two-photon absorption. The results identify silicon as a promising platform for parametric processes in mid-infrared spectral region.

Journal Article Type Article
Acceptance Date Aug 8, 2011
Online Publication Date Aug 22, 2011
Publication Date Aug 22, 2011
Deposit Date Aug 21, 2024
Journal Applied Physics Letters
Print ISSN 0003-6951
Electronic ISSN 1077-3118
Publisher AIP Publishing
Peer Reviewed Peer Reviewed
Volume 99
Issue 8
DOI https://doi.org/10.1063/1.3630130