All Outputs (4)

Atmospheric pressure glow discharge plasma enhanced chemical vapour deposition of titania and aluminium based thin films (2009)
Thesis
Hodgkinson, J. Atmospheric pressure glow discharge plasma enhanced chemical vapour deposition of titania and aluminium based thin films. (Thesis). Salford : University of Salford

Atmospheric pressure glow discharge (APGD) plasma CVD was used to deposit
thin films of titania at 200 °C using two different precursors. The resulting films were
characterised using techniques including XPS, RBS and XRD. It was established that... Read More about Atmospheric pressure glow discharge plasma enhanced chemical vapour deposition of titania and aluminium based thin films.

Novel precursors for the growth of TiO2 by liquid injection MOCVD (2009)
Thesis
Clarke, C. Novel precursors for the growth of TiO2 by liquid injection MOCVD. (Thesis). Salford : University of Salford

A comprehensive examination of the feasibility of producing new titania precursors by
ligand substitution reactions involving the reaction between titanium tetra-isopropoxide
and various dimethylamino alcohols has resulted in the synthesis, charact... Read More about Novel precursors for the growth of TiO2 by liquid injection MOCVD.

The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods (2008)
Thesis

A novel TCVD procedure was employed for the preparation for the
preparation of supported gold catalysts using dimethyl gold
acetylacetonates Me 2 Au(acac) as the volatile precursor. Preliminary
experiments on the use of TCVD for the preparation of... Read More about The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods.

Combustion CVD : exploration of potential for optical thin film synthesis (2006)
Thesis
Gutierrez, G. Combustion CVD : exploration of potential for optical thin film synthesis. (Thesis). Salford : University of Salford

The aim of this PhD was to undertake a study of combustion chemical
vapour deposition (combustion CVD or CCVD) for the optical thin film
materials synthesis. The most common variables for thin film formation were
investigated, e.g. precursor volat... Read More about Combustion CVD : exploration of potential for optical thin film synthesis.