In-situ monitoring for CVD processes
(2003)
Journal Article
Hopfe, V., Sheel, D., Spee, C., Tell, R., Martin, P., Beil, A., …Graehlert, W. (2003). In-situ monitoring for CVD processes. Thin Solid Films, 442(1-2), 60-65. https://doi.org/10.1016/S0040-6090%2803%2900943-X
Aiming towards process control of industrial high yield/high volume CVD reactors, the potential of optical sensors as a monitoring tool has been explored. The sensors selected are based on both Fourier transform infrared spectroscopy (FTIR) and tunab... Read More about In-situ monitoring for CVD processes.