All Outputs (6)

Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells (2009)
Journal Article
Sheel, D., Yates, H., Evans, P., Dagkaldiran, U., Gordijn, A., Finger, F., …Vanecek, M. (2009). Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells. Thin Solid Films, 517(10), 3061-3065. https://doi.org/10.1016/j.tsf.2008.11.121

The potential of thin film photovoltaic technologies in supporting sustainable energy policies has led to increasing interest in high performance transparent conducting oxides (TCOs), and in particular doped SnO2, as electrical contacts for solar c... Read More about Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells.

Optical properties of SnO2:F films deposited by atmospheric pressure CVD (2009)
Journal Article
Remes, Z., Vanecek, M., Yates, H., Evans, P., & Sheel, D. (2009). Optical properties of SnO2:F films deposited by atmospheric pressure CVD. Thin Solid Films, 517(23), 6287-6289. https://doi.org/10.1016/j.tsf.2009.02.109

SnO2 thin films, is compatible with industrial requirements such as high process speed, scaling to wide substrate widths and low costs. Precise method for measuring the optical absorptance in the spectral range 300–1700 nm combines transmittance, r... Read More about Optical properties of SnO2:F films deposited by atmospheric pressure CVD.

Low temperature growth of photoactive titania by atmospheric pressure plasma (2009)
Journal Article
Hodgkinson, J., Yates, H., & Sheel, D. (2009). Low temperature growth of photoactive titania by atmospheric pressure plasma. Plasma Processes and Polymers, 6(9), 575-582. https://doi.org/10.1002/ppap.200900028

Atmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 8C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing... Read More about Low temperature growth of photoactive titania by atmospheric pressure plasma.

Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs (2009)
Journal Article
Yates, H., Evans, P., Sheel, D., Dagkaldiran, U., Gordijn, A., Finger, F., …Vanecek, M. (2009). Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs. International Journal of Nanotechnology, 6(9), 816-827. https://doi.org/10.1504/IJNT.2009.026742

High performance transparent conducting oxides (TCOs), have significance for optimising PV performance. We have developed an advanced atmospheric pressure chemical vapour deposition process, by applying fast experimentation and using a combinatorial... Read More about Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs.

One pot direct hydrothermal growth of photoactive TiO2 films on glass (2009)
Journal Article
Vernardou, D., Stratakisc, E., Kenanakis, G., Yates, H., Couris, S., Pemble, M., …Katsarakis, N. (2009). One pot direct hydrothermal growth of photoactive TiO2 films on glass. Journal of Photochemistry and Photobiology A: Chemistry, 202(2-3), 81-85. https://doi.org/10.1016/j.jphotochem.2008.11.015

We demonstrate that titanium (IV) oxide films may be deposited on Corning glass by a simple, one-pot, low temperature (95 ◦C) hydrothermal growth technique and that providing the correct conditions are employed, the films produced show clear photoa... Read More about One pot direct hydrothermal growth of photoactive TiO2 films on glass.

Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD (2009)
Journal Article
Dagkaldiran, U., Gordijn, A., Finger, G., Yates, H., Evans, P., Sheel, D., …Vanecek, M. (2009). Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD. Materials Science and Engineering: B, 159, 6-9. https://doi.org/10.1016/j.mseb.2008.10.037

In this paper we report the results of a study assessing a newly developed deposition process for Fdoped SnO2 films by CVD operating at atmospheric pressure (APCVD). The technology is designed to be compatible with industrial requirements such as h... Read More about Amorphous silicon solar cells made with SnO2:F TCO films deposited by atmospheric pressure CVD.