Methods of forming thin metal-containing films by chemical phase deposition
Patent
Kanjolia, R., Odedra, R., Boag, N., & Weyburne, D. (in press). Methods of forming thin metal-containing films by chemical phase deposition
Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic layer deposition (ALD) and chemical vapor deposition (CVD), are provided. The methods comprise delivering at least one organometallic precursor to a subs... Read More about Methods of forming thin metal-containing films by chemical phase deposition.