Outputs (16)

Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer (2005)
Patent
McGown, A., & Flower, K. (2005). Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer

The invention relates to the treatment of cancers, in particular, cancers that are resistant to platinum based chemotherapeutic agents. A pharmaceutical composition for the treatment of cancer comprising an effective amount of a compound having two g... Read More about Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer.

Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer (2005)
Patent
McGown, A., & Flower, K. (2005). Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer

The invention relates to the treatment of cancers, in particular, cancers that are resistant to platinum based chemotherapeutic agents. A pharmaceutical composition for the treatment of cancer comprising an effective amount of a compound having two g... Read More about Use of a compound having two gold (1) atoms each covalently bonded to a carbon atom in a covalent link connecting the two gold (1) atoms for the treatment of cancer.

High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films
Patent
Odedra, R., Boag, N., Anthis, J., & Kanjolia, R. (in press). High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films

A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R.sup.1 and R.sup.2 are independently C.sub.2-C.sub.8-a... Read More about High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films.

Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films
Patent
Odedra, R., Boag, N., Anthis, J., Kanjolia, R., & Saly, M. (in press). Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films

Organometallic complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The organometallic complexes are (alkyl-substituted .eta..sup.3-allyl)(carbonyl)metal complexes.

Methods of forming thin metal-containing films by chemical phase deposition
Patent
Kanjolia, R., Odedra, R., Boag, N., & Weyburne, D. (in press). Methods of forming thin metal-containing films by chemical phase deposition

Methods of forming thin metal-containing films by chemical phase deposition, particularly atomic layer deposition (ALD) and chemical vapor deposition (CVD), are provided. The methods comprise delivering at least one organometallic precursor to a subs... Read More about Methods of forming thin metal-containing films by chemical phase deposition.

Organometallic precursors for use in chemical phase deposition processes
Patent
Kanjolia, R., Odedra, R., & Boag, N. (in press). Organometallic precursors for use in chemical phase deposition processes

An organometallic precursor is provided. The precursor corresponds in structure to Formula I: Cp(R).sub.nM(CO).sub.2(X) (Formula I) wherein: M is Ru, Fe or Os; R is C.sub.1-C.sub.10-alkyl; X is C.sub.1-C.sub.10-alkyl; and n is 1, 2, 3, 4 or 5. The pr... Read More about Organometallic precursors for use in chemical phase deposition processes.